NSF award 2534141 · Ohio University

UV Radiation-assisted Electron Beam Lithography with in situ Singlet Oxygen Resist Development for Patterning sub-5 nm Features

Final report due

29 December 2029

in 1,168 days · The award ends on 31 August 2029.

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award ending 2029-08-31 · Research.gov
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PAPPG 24-1: “at least 45 days prior to the end date”
No-cost extension notice21 Aug 2029in 1038 days
award ending 2029-08-31 · Research.gov
PAPPG 24-1: “at least ten calendar days prior to the end date”
Final report due29 Dec 2029in 1168 days
award ending 2029-08-31 · Research.gov
PAPPG 24-1: “no later than 120-days following the end date of the award”
Project outcomes report due29 Dec 2029in 1168 days
award ending 2029-08-31 · Research.gov
PAPPG 24-1: “no later than 120 days following the end date”
Award is closed out29 Dec 2029in 1168 days
award ending 2029-08-31 · Research.gov
PAPPG 24-1: “financially closed out 120 days after their expiration date”

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NSF rules say the final report is due no later than 120 days after that.
So the final report is due by 29 December 2029.

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Award card

Award number: 2534141
Period of support: 1 Sep 2026 – 31 Aug 2029
Amount: $550,000
Awardee: Ohio University, Athens, OH
Program: AM-Advanced Manufacturing
Directorate: ENG

Abstract

This grant supports research aimed at advancing patterning technology at the nanometer scale by augmenting the widely used technique of electron beam lithography. The central aspect of this project is to use a super-fine electron beam as a patterning tool to fabricate ultra-small structures for any application that needs exceedingly small custom features. The research aims to develop new enhancements that enable…

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